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mohamed
boufnichel
mohamed.boufnichel@gmail.com
Journal articles
2005
M Boufnichel
,
P Lefaucheux
,
S Aachboun
,
R Dussart
,
P Ranson
(2005)
Origin,
control
and
elimination
of
undercut
in
silicon
deep
plasma
etching
in
the
cryogenic
process
Microelectronic Engineering
77:
3-4.
327-336
APRIL
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